Article In: scopus, orcid

Properties of high growth rate amorphous silicon deposited by MC-RF-PECVD

Vacuum

Lavareda, G.; Nunes De Carvalho, C.; Chu, V. — 2002

Key information

Authors:

Lavareda, G. (Guilherme António Rodrigues Lavareda); Nunes De Carvalho, C.; Amaral, A. (Ana Maria Heleno Branquinho de Amaral); Conde, J.P. (João Pedro Estrela Rodrigues Conde); Vieira, M.; Chu, V.

Published in

01/01/2002

Publication details

Authors in the community:

Title of the publication container

Vacuum

First page or article number

245

Last page

248

Volume

64

Issue

3-4

DOI

10.1016/S0042-207X(01)00293-7

Fields of Science and Technology (FOS)

materials-engineering - Materials engineering

Publication language (ISO code)

eng - English

Rights type:

Only metadata available